Patent
1988-11-02
1990-12-04
Hille, Rolf
357 71, 357 45, H01L 2968, H01L 2348, H01L 2710
Patent
active
049757539
ABSTRACT:
A semiconductor memory device includes a plurality of bit lines formed on an interlayer insulation film and arranged with a first pitch defining a distance between neighboring bit lines, and word lines which are formed on an insulation film formed on the bit lines and which are arranged with a second pitch defining a distance between neighboring word lines. One of the bit and word lines which has a relatively wide pitch comprises an aluminum-based metallization film, and the other line which has a relatively narrow pitch comprises a refractory metal silicide-based metallization film.
REFERENCES:
patent: 4423432 (1983-12-01), Stewart et al.
patent: 4845544 (1989-07-01), Shimizu
patent: 4910566 (1990-03-01), Ema
Fujitsu Limited
Hille Rolf
Limanek Robert P.
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