Method of manufacturing high magnetic flux density electrodeposi

Details Method of manufacturing high magnetic flux density electrodeposi Method of manufacturing high magnetic flux density electrodeposi

1990-04-19

1991-02-05

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

204 445, C25D 356

Patent

active

049902253

ABSTRACT:
A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film, comprising the steps of: forming an FeCoNiCr or an FeCoNiCu quaternary alloy thin film on a cathode by using an electrodepositing electrolyte bath to which four types of ions of Fe, Co, Ni and Cr or Cu have been supplied through sulfate and/or hydrochloride, each of which contains bivalent or tervalent Fe, Co, Ni, Cr and Cu ions, by using a bath having on the basis of the density of [Ni.sup.2+ ] ion such compositions as 0.02<[Co.sup.2+ ]/[Ni.sup.2+ ]<0.9, 0.095<[Fe.sup.2+ ]/[Ni.sup.2+ ]<0.4 and 0.075<[Cr.sup.3+ ]/[Ni.sup.2+ ]<0.4, or 0.001<[Cu.sup.2+ ]/[Ni.sup.2+ ]<0.03; and arranging electrodeposition current density J to be in a range of J<60 (mA/cm.sup.2) at the cathode.

REFERENCES:
patent: 3374156 (1968-03-01), Schiffman et al.
patent: 3480522 (1969-11-01), Brownlow
patent: 3533922 (1970-10-01), Semienko et al.
patent: 4673471 (1987-06-01), Kagechika et al.

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