Projection exposure apparatus

Photocopying – Projection printing and copying cameras – Step and repeat

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Details

355 67, 356401, 250548, G03B 2752

Patent

active

059299789

ABSTRACT:
A projection exposure apparatus including a projection optical system for projecting a pattern formed in a reticle onto a photosensitive substrate, and an alignment system for positioning the reticle and the photosensitive substrate with respect to each other by observing a reticle mark alignment formed on the reticle and a substrate alignment mark formed on the photosensitive substrate; wherein the alignment system comprises an imaging section having an imaging surface tilted with respect to an optical axis of the alignment system and with respect to a direction orthogonal to a measuring direction for each of the alignment marks, the imaging section having respective best focus positions for the alignment marks at different positions on the imaging surface; and wherein the alignment marks are simultaneously detected at the respective best focus positions so as to position the reticle and the photosensitive substrate with respect to each other. The best focus positions are determined by the focus detecting section within the image processing system according to image signals obtained from the imaging section.

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patent: 5783833 (1998-07-01), Sugaya et al.

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