Heating system for substrates

Details Heating system for substrates Heating system for substrates

1989-03-03

1990-12-04

Walberg, Teresa J.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219405, F27B 514, F27D 1100

Patent

active

049755617

ABSTRACT:
A heating system for use in chemical vapor deposition equipment of the type wherein a reactant gas is directed in horizontal flow for depositing materials on a substrate which is supported in a reaction chamber on a susceptor which is rotatably driven for rotating the substrate about an axis which extends normally from its center. The heating system works in conjunction with a special heat sensing arrangement and includes an upper heating element assembly, a lower heating element assembly and a heat concentrator mechanism whic interact to provide rapid temperature build-up at the beginning of a processing cycle, rapid temperature attenuation at the end of a processing cycle and a controlled flat temperature profile during the processing cycle.

REFERENCES:
patent: 3836751 (1974-09-01), Anderson
patent: 4533820 (1985-08-01), Shimizu
patent: 4535228 (1985-08-01), Mimura
patent: 4545327 (1985-10-01), Campbell
patent: 4654509 (1987-03-01), Robinson
patent: 4680451 (1987-07-01), Gat

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