Vapor deposition process for depositing an organo-metallic compo

Details Vapor deposition process for depositing an organo-metallic compo Vapor deposition process for depositing an organo-metallic compo

1989-11-02

1990-12-04

Morgenstern, Norman

Coating processes

Electrical product produced

Welding electrode

427226, 427255, 4272552, 427102, 427104, 427234, C23C 1619, C23C 1622, C23C 1646

Patent

active

049752995

ABSTRACT:
The invention comprises applying to a substrate a precursor of an organo-metallic compound, the precursor preferably consists of one or more pairs of ligand substituted Group III and V elements. The precursor is decomposed and deposits onto a receiving layer held at the decomposing temperature of the vaporized material.

REFERENCES:
patent: 3291657 (1966-12-01), Sirtl et al.
patent: 3705059 (1972-12-01), Kun
patent: 3754975 (1973-08-01), Spiller
patent: 3802967 (1974-04-01), Ladany
patent: 4250205 (1981-02-01), Constant et al.
patent: 4279670 (1981-07-01), Steele
patent: 4427714 (1984-01-01), Davey
patent: 4543275 (1985-09-01), Akashi et al.
patent: 4594264 (1986-06-01), Jensen
patent: 4752455 (1988-06-01), Mayer
patent: 4759951 (1988-07-01), Itoh et al.
patent: 4780334 (1988-10-01), Ackerman
patent: 4833103 (1989-05-01), Agostinelli et al.
patent: 4892751 (1990-01-01), Miyake et al.
patent: 4895735 (1990-01-01), Cook
Veuhoff et al., "Metalorganic CVD of GaAs in a Molecular Beam System", Journal of Crystal Growth, vol. 55, No. 1, pp. 30-34, 1981.
F. H. Nicoll, Journal of the Electrochemical Society, 11/63, 1165-1167.
P. H. Robinson, RCA Review, 12/63, 574-584.
F. Chavez et al., Journal of Applied Physics, 1983, 6646-6651.
D. Cote et al. Photoresist Stripping, 1986, 1925-1934.
A. H. Cowley et al., Journal of the American Chemical Society, 1988, 6248-6249.
D. E. Heaton et al., Polyhedron, 1988, 1901-1908.
R. K. Schulze et al., Journal of Vacuum Science Technology, 2162-2163, 1988.
M. J. Almond et al., Chemistry in Britain, 1988, 1130-1132.
Kouvetakis et al., Chemistry of Materials, 1989, 476-478.
D. C. Boyd et al., Chemistry of Materials, 1989, 119-124.

Affiliated with

Also associated with

Rating

Vapor deposition process for depositing an organo-metallic compo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapor deposition process for depositing an organo-metallic compo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor deposition process for depositing an organo-metallic compo will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-882540