Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-04-02
1998-11-17
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
058374035
ABSTRACT:
The present invention provides a photomask for removing the notching phenomenon, which occurs when a photoresist pattern is formed on a highly reflective under layer.
In accordance with the present invention, there is disclosed a photomask used in forming photoresist patterns in a semiconductor device, wherein said semiconductor device includes a inclined metal layer by a topology of underlayers, said photomask comprising: a transparent substrate; main patterns formed on said transparent substrate; and dummy patterns formed on said transparent substrate, wherein said dummy patterns positioned between main patterns and positioned in an area corresponding to said inclined metal layer, and wherein said dummy patterns have a predetermined width and interval so that said dummy patterns leave no corresponding photoresist pattern, whereby said dummy patterns remove a notching phenomenon by attenuating the light intensity from a light source.
REFERENCES:
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5487962 (1996-01-01), Rolfson
patent: 5591550 (1997-01-01), Choi et al.
patent: 5672450 (1997-09-01), Rolfson
Hyundai Electronics Industries Co,. Ltd.
Rosasco S.
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