Method and apparatus for measuring deviation between patterns on

Details Method and apparatus for measuring deviation between patterns on Method and apparatus for measuring deviation between patterns on

1992-08-03

1994-05-17

Evans, F. L.

Optics: measuring and testing

By polarized light examination

With light attenuation

356401, 250548, 355 53, G01B 1100

Patent

active

053132726

ABSTRACT:
A method and apparatus for measuring the deviation between elements on an object includes the steps of and devices for performing the steps of forming at least a first physicooptical element on the object: forming at least a second physicooptical element on the object, the first and second physicooptical elements having lens functions; projecting light beams onto the first and second physicooptical elements on the object and detecting the incident positions of light beams travelling from the first and second physicooptical elements, having been subjected to the lens functions of the first and second physicooptical elements, on a predetermined surface; and detecting the deviation between the first and second physicooptical elements on the object from the relationship between the detected incident positions of the light beams.

REFERENCES:
patent: 4962423 (1990-10-01), Yamada et al.
patent: 5028797 (1991-07-01), Abe et al.
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5142156 (1992-08-01), Ozawa et al.
patent: 5148037 (1992-09-01), Suda et al.
patent: 5216257 (1993-01-01), Brueck et al.
IBM Technical Disclosure Bulletin, vol. 13, No. 4, "Aligning and Inspecting Microelectronic Circuits", J. S. Harper, et al., Sep. 1970.
Patent Abstracts of Japan, Abstract of Japanese No. JP-A-62 086 725, vol. 11, No. 286, Publication Date: Sep. 16, 1987.

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