Electric heating – Metal heating – By arc
Patent
1992-04-28
1994-05-17
Albritton, C. L.
Electric heating
Metal heating
By arc
21912183, B23K 2600
Patent
active
053130448
ABSTRACT:
An ellipsometer measures/monitors the change in polarization of light upon reflection from a wafer sample. The temperature of the wafer substrate surface and the film thickness are then simultaneously determined in situ using ellipsometry where the true wafer temperature is determined in real-time by the computer from a calculation based on the known temperature dependence of the refractive index of the wafer. The power output to the lamps is then adjusted accordingly to raise or lower the wafer temperature within the apparatus. This process continues automatically to maintain the desired temperature and film growth rate until the desired film thickness is achieved.
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Massoud Hisham Z.
Sampson Ronald K.
Albritton C. L.
Duke University
Jenkins Richard E.
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