Method and apparatus to evaluate effectiveness of cleaning syste

Chemistry: electrical and wave energy – Apparatus – Electrolytic

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204400, 204416, 2041531, G01N 2726

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053125363

ABSTRACT:
An apparatus and method for a cleaning process control is disclosed. The apparatus includes two parallel plates of glass that have a plurality of shims positioned therebetween and a means for clamping these plates of glass firmly against the shims. A contaminant is positioned between the plates of glass and the apparatus is cleaned using a selected cleaning process. The apparatus can then be inspected to determine the effectiveness of a particular cleaning process by peering through the transparent glass plates to inspect for any remaining contaminant. The apparatus can then be cleaned more extensively and used again to check a different cleaning process.

REFERENCES:
patent: 4165270 (1979-08-01), Ost et al.
patent: 4456515 (1984-06-01), Krueger et al.
patent: 4604144 (1986-08-01), Wong
patent: 4905371 (1990-06-01), Pai
patent: 4939469 (1990-07-01), Ludwig et al.
patent: 5006212 (1991-04-01), DiSanto et al.
patent: 5084961 (1992-01-01), Yoshikawa
patent: 5110662 (1992-05-01), Depauw et al.
A Comparison of CFC Alternatives Assessment Programs, Colin Lea, Journal of SMT, Apr. 1992, pp. 4-15.

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