Processing apparatus and a processing method

Details Processing apparatus and a processing method Processing apparatus and a processing method

1998-03-24

1999-12-14

Fleming, Fritz

Electricity: electrical systems and devices

Discharging or preventing accumulation of electric charge

By charged gas irradiation

361212, 361234, H05F 306

Patent

active

060025727

ABSTRACT:
The processing apparatus prevents difficulty in separation of the substrate from the base because of charges on the substrate when the substrate is lifted from the base for substrate placing during processing. The processing apparatus comprises pins to lift up the substrate on the base and a neutralization apparatus to discharge ionized gas to the gap between the bottom of the substrate lifted from the base by the pins and the top of the base. When ionized gas is discharged to the substrate and the base, the charges are neutralized.

REFERENCES:
patent: 3976916 (1976-08-01), Saurenman
patent: 4319302 (1982-03-01), Moulden
patent: 4333123 (1982-06-01), Moulden
patent: 4339782 (1982-07-01), Yu et al.
patent: 4667110 (1987-05-01), Kariya
patent: 4974115 (1990-11-01), Breidegam et al.
patent: 5057966 (1991-10-01), Sakata et al.
patent: 5116583 (1992-05-01), Batchelder et al.
patent: 5382311 (1995-01-01), Ishikawa et al.
patent: 5474614 (1995-12-01), Robbins
patent: 5488222 (1996-01-01), Gault et al.
patent: 5550703 (1996-08-01), Beyer et al.
patent: 5552955 (1996-09-01), Mashiro et al.
patent: 5596478 (1997-01-01), Ohmi et al.
patent: 5621605 (1997-04-01), Inaba et al.
patent: 5750011 (1998-05-01), Ohmi et al.

Affiliated with

Also associated with

Rating

Processing apparatus and a processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Processing apparatus and a processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing apparatus and a processing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-869310