Method of forming a layer of thin film on a substrate having a m

Details Method of forming a layer of thin film on a substrate having a m Method of forming a layer of thin film on a substrate having a m

1984-09-12

1986-07-22

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

427124, 427250, C23C 1600

Patent

active

046019227

ABSTRACT:
A method of forming a thin layer on a substrate by vapor deposition wherein particles of the material to be constituted the thin layer are caused to fly in such a direction that they reach the surface of the substrate at substantially a right angle relative to the latter. The substrate is located opposite to a particle generating source. A shield device with a slit is provided in the proximity of the substrate located opposite to the particle generating source and between the substrate and the particle generating source so that they are introduced onto the surface of the substrate through the slit at substantially a right angle relative to the surface of the substrate.

REFERENCES:
patent: 2676114 (1954-04-01), Barkley
patent: 2971862 (1961-02-01), Baer et al.
patent: 3520716 (1970-07-01), Okamoto et al.
patent: 4098919 (1978-07-01), Morimoto et al.
patent: 4344988 (1982-08-01), Sono et al.
patent: 4354909 (1982-10-01), Takagi et al.
patent: 4374162 (1983-02-01), Takagi
patent: 4394210 (1983-07-01), Morimoto et al.
patent: 4477488 (1984-10-01), Sugita et al.

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