Cleaning process for p-type silicon surface

Details Cleaning process for p-type silicon surface Cleaning process for p-type silicon surface

1980-05-28

1981-04-28

Fisher, Richard V.

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 4, 134 28, 134 29, 134 30, 148 15, B08B 704

Patent

active

042643740

ABSTRACT:
A cleaning process for a silicon surface, especially a p-type silicon surface. The surface is exposed to HF/H.sub.2 O fumes, thereby obtaining a hexafluosilicic acid film on the surface. The exposed surface is then treated with a water-based, oxidizing, non-silicon-etchant cleaning agent. There is no intermediate rinse between the latter two steps.

REFERENCES:
patent: 2948642 (1960-08-01), MacDonald
Kern and Puotinen, "Cleaning Solutions Based on Hydrogen Peroxide . . .", RCA Review, Jun. 1970, pp. 187-206.
Henderson, "Silicon Cleaning With Hydrogen Peroxide Solutions . . .", Journal of the Electrochemical Society, Jun. 1972, pp. 772-775.
Raider, Flitsch, and Palmer, "Oxide Growth of Etched Silicon . . .", Journal of the Electrochemical Society, Mar. 1975, pp. 413-418.
Beyer and Whitehill: ll, "Etching of SiO.sub.2 in Gases HF/H.sub.2 O", IBM Technical Disclosure Bulletin, vol. 19, No. 7, Dec. 1976, p. 2513.
Beyer, "Silicon Surface Cleaning Process", IBM Technical Disclosure Bulletin, vol. 20, No. 5, Oct. 1977, pp. 1746-1747.
Meek, Buck and Gibbon, "Silicon Surface Contamination . . .", Journal of the Electrochemical Society, Sep. 1973, pp. 1241-1242.

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