Mask for use in a projection electron beam exposure

Details Mask for use in a projection electron beam exposure Mask for use in a projection electron beam exposure

1998-03-31

1999-12-14

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

06001511&

ABSTRACT:
An electron beam exposure mask comprises a mask body and a plurality of unit patterns each having an opening pattern iteratively formed in the mask. The mask body has a thickness profile controlled based on the opening density of the pattern in the mask area.

REFERENCES:
patent: 5723233 (1998-03-01), Garza et al.

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