Metal oxide semiconductor field-effect transistor with metal sou

Electrical transmission or interconnection systems – Nonlinear reactor systems – Parametrons

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357 237, 357 65, 357 86, 307279, H01L 2702

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active

046397582

ABSTRACT:
A source region and a drain region are formed in a semiconductor layer, a thin insulating layer of SiO.sub.2 is formed on the semiconductor layer, and a gate electrode is formed thereover. Al metal forms ohmic contacts with the source and drain regions to provide a source electrode and a drain electrode, respectively. Al diffused in the drain region remains within the drain region, and the drain region and the substrate region form a p-n junction. Al diffused in the source region traverses the source region and reaches the substrate region to form an ohmic contact between the source region and the substrate region.

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