Method for estimating optimum position of a wafer for forming im

Details Method for estimating optimum position of a wafer for forming im Method for estimating optimum position of a wafer for forming im

1996-12-06

1999-01-05

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

G03F 900

Patent

active

058560530

ABSTRACT:
Apparatus for determining the optimum position of an object with respect to a focal point of a focused beam of radiation. The apparatus has a resolution limit and includes a radiation source, a lens for focusing the beam of radiation on the object, and a reticle interposed between the radiation source and the lens. A focusing pattern, formed on the reticle, when projected onto the object by the focusing means, produces a projected focusing pattern which is not resolvable, the resolution of the projected focusing pattern being not greater than the resolution limit of the apparatus.

REFERENCES:
patent: 5087537 (1992-02-01), Conway et al.
patent: 5298365 (1994-03-01), Okamoto et al.
patent: 5447810 (1995-09-01), Chen et al.

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