Coating apparatus – Gas or vapor deposition
Patent
1997-06-05
1999-12-14
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
118725, C23C 1600
Patent
active
060011823
ABSTRACT:
In the course of processing integrated circuits production wafers are placed within a plurality of production boats on a platform. A first baffle boat is placed at a front end of the plurality of production boats. The first baffle boat contains a first plurality of wafers made of quartz. A second baffle boat is placed at a rear end of the plurality of production boats. The second baffle boat contains a second plurality of wafers made of quartz. The plurality of production boats, the first baffle boat and the second baffle boat are placed within a processing chamber.
REFERENCES:
patent: 5020476 (1991-06-01), Bay et al.
patent: 5064367 (1991-11-01), Philipossian
patent: 5409539 (1995-04-01), Turner et al.
patent: 5645417 (1997-07-01), Smith
patent: 5683513 (1997-11-01), Fujimaki
Caton Lynn
Page Allen
Breneman Bruce
Fieler Erin
VLSI Technology Inc.
Weller Douglas L.
LandOfFree
Waferless boat used as baffle during wafer processing does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Waferless boat used as baffle during wafer processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Waferless boat used as baffle during wafer processing will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-859293