Waferless boat used as baffle during wafer processing

Coating apparatus – Gas or vapor deposition

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118725, C23C 1600

Patent

active

060011823

ABSTRACT:
In the course of processing integrated circuits production wafers are placed within a plurality of production boats on a platform. A first baffle boat is placed at a front end of the plurality of production boats. The first baffle boat contains a first plurality of wafers made of quartz. A second baffle boat is placed at a rear end of the plurality of production boats. The second baffle boat contains a second plurality of wafers made of quartz. The plurality of production boats, the first baffle boat and the second baffle boat are placed within a processing chamber.

REFERENCES:
patent: 5020476 (1991-06-01), Bay et al.
patent: 5064367 (1991-11-01), Philipossian
patent: 5409539 (1995-04-01), Turner et al.
patent: 5645417 (1997-07-01), Smith
patent: 5683513 (1997-11-01), Fujimaki

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Waferless boat used as baffle during wafer processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Waferless boat used as baffle during wafer processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Waferless boat used as baffle during wafer processing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-859293

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.