Projection exposure apparatus and device manufacturing method ca

Details Projection exposure apparatus and device manufacturing method ca Projection exposure apparatus and device manufacturing method ca

1995-04-19

1999-08-03

Braun, Fred L

Photocopying

Projection printing and copying cameras

Illumination systems or details

G03B 2772

Patent

active

059332190

ABSTRACT:
In a projection apparatus and method, a mask and a substrate are scanned relative to an exposure beam in a scanning direction, with the exposure beam having a direction of polarization. The mask contains at least first and second patterns, with the first pattern extending in a different longitudinal direction than the second pattern, and the first and second patterns being formed at different positions with respect to the scanning direction. The direction of polarization of the exposure beam is changed during the scanning operation so that each of the first and second patterns is exposed to a polarized light beam which is polarized in the same direction as the longitudinal direction of the pattern.

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patent: 5467166 (1995-11-01), Shiraishi
patent: 5627627 (1997-05-01), Suzuki
Yasuyuki Unno, "Polarization Effect of Illumination Light", SPIE, vol. 1927, Optical/Laser Microlithography VI, pp. 879-891 (1993).
Koichi Matsumoto, et al., "Issues and Method of Designing Lenses for Optical Lithography", Optical Engineering, vol. 31, No. 12, pp. 2657-2664 (Dec. 1992).

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