Method for determining phase variance and shifter stability of p

Details Method for determining phase variance and shifter stability of p Method for determining phase variance and shifter stability of p

1996-07-03

1998-09-15

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 30, G03F 900

Patent

active

058076476

ABSTRACT:
A method for easily, accurately and cost-effectively determining phase variance and shifter stability in a phase shifting material is provided. The method relies on the image shortening phenomenon to determine how much phase variance there is in the phase shifting material under examination. In particular, the present invention determines phase variance based on a comparison of the shift in best focus position between an image printed according to an opaque mask and an image printed according to a phase shifting halftone mask using predetermined patterns that are sensitive to, and display a pronounced, image shortening effect, thereby facilitating accurate determination of the respective best focus positions of the images exposed by the opaque and halftone masks. Projecting the best focus position of the image exposed by the halftone mask onto the defocus continuum of the image exposed by the opaque masks enables a measurement of shift in the halftone mask image, thereby permitting quick, easy, accurate and cost-effective determination of the phase variance caused by the halftone material.

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