Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1994-04-14
1995-02-28
Dzierzynski, Paul M.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 3700
Patent
active
053939883
ABSTRACT:
A mask is used for exposing a desired pattern on a substrate by a charged particle beam exposure. The mask comprises a plurality of pattern groups each including a plurality of exposure patterns within an approximately rectangular region, and a plurality of position matching patterns formed at positions different from those of the exposure pattern groups, where positional relationships of each of the exposure pattern groups and the position matching patterns are predetermined and fixed.
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Randal et al., "Masked Ion Beam Resist Exposure Using Grid Support Stencil Masks", J. Vac. Sci. Technol. B3(1), Jan./Feb. 1985.
Zapka et al., "High Resolution Distortion Measurements of Electron-Beam Transmission Masks", J. Vac. Sci. Technol. B3(1), Jan./Feb. 1985.
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Dzierzynski Paul M.
Fujitsu Limited
Nguyen Kiet T.
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