Method for forming light absorbing aluminum nitride films by ion

Details Method for forming light absorbing aluminum nitride films by ion Method for forming light absorbing aluminum nitride films by ion

1993-11-02

1995-02-28

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427528, 427523, 427164, 427165, 427166, 4274191, B05D 306

Patent

active

053935748

ABSTRACT:
A light absorbing, low reflectance coating and method of fabricating the coating provided by electron beam evaporation of aluminum onto substrates bombarded with nitrogen ions to produce a randomly textured coating which traps light in a labyrinth. The coating is electrically insulating except for the first few tens of atoms which remain metallic. Absorptance exceeds 90% in the 0.4 to 16 .mu.m region. The coating is flexible and can be deposited on a polymer base.

REFERENCES:
patent: 4634600 (1987-01-01), Shimizu et al.
Ogata et al, "Properties of Aluminum Nitride Films by an Ion Beam and Vapor Deposition Method", Nucl. Instrum. Methods Phys. Res., Sect. B, B39(1-4) (1989) pp. 178-181.
Wang et al, "Composition and Structure of Titanium Nitride Films Prepared by Ion-Beam Enhanced Deposition," Nucl. Instrum. & Methods Phys. Res. 1991, V59, pp. 272-275.

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