Process for forming deposition film

Details Process for forming deposition film Process for forming deposition film

1983-04-29

1984-05-15

Smith, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 531, 427 541, 427 55, 427 36, 427 86, 427 87, 427 74, H01L 4500

Patent

active

044488017

ABSTRACT:
This invention is a process for forming film of amorphous material on a support. The amorphous material comprises at least either of hydrogen atom or halogen atom and at least either of silicon atom or germanium atom as a matrix. The film is formed by utilizing a discharge of direct current or low frequency alternating current and, particularly, is radiated with an electromagnetic wave which sensitizes the said amorphous material.

REFERENCES:
patent: 4217374 (1980-08-01), Ovshinsky
patent: 4226643 (1980-10-01), Carlson
patent: 4226897 (1980-10-01), Coleman
Taniguchi et al., "Amorphous Silicon Hydrogen Alloys Produced under Magnetic Field", Journal of Non-Crystalline Solids, 35 & 36, (Jan.-Feb. 1980), pp. 189-194.

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