Method and apparatus for evaporation arc stabilization including

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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118723, 204298, 427 42, C23C 1500

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active

044486596

ABSTRACT:
Apparatus and method for evaporation arc stabilization including a target having a surface of material of non-permeable material to be evaporated; circuitry for establishing an arc on the target surface for evaporating the target material, the arc being characterized by the presence of charged particles and a cathode spot which randomly migrates over the target surface; and a confinement ring surrounding the target surface, the ring being composed of a magnetically permeable material to confine the cathode spot to the target. The anode is closely spaced to the ring to prevent the arc from moving off the target and the ring, during initial arc cleaning of the target. In lieu of the magnetically permeable confinement ring, the anode itself may be permeable. Various configurations of the confinement ring are also disclosed together with various features for improving the operation thereof.

REFERENCES:
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patent: 3783231 (1974-01-01), Sablev et al.
patent: 3793179 (1974-02-01), Sablev et al.
patent: 3836451 (1974-12-01), Snaper
patent: 4180450 (1979-12-01), Morrison
patent: 4391679 (1983-07-01), Morrison
Naoe et al., Jap. J. Appl. Phys. 10, (1971), Jun. 71, pp. 747-753.
Rakhovskii, IEEE Transactions of Plasma Science, vol. PS-4, No. 2, 1976, pp. 81-99.

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