Process for removing sulphur compounds contained in a residual g

Chemistry of inorganic compounds – Sulfur or compound thereof – Elemental sulfur

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C01B 1704

Patent

active

051320983

ABSTRACT:
Process for removing sulfur compounds contained in a residual gas with recovery of said compounds in the form of sulfur, wherein a gas obtained from a residual gas containing H.sub.s S and SO.sub.2 and having a temperature lower than 160.degree. C. is subjected to a catalytic CLAUS reaction phase with deposition of sulfur on the catalyst and periodic regeneration of the sulfur-laden catalyst and cooling of the regenerated catalyst. The gas brought in contact with the CLAUS catalyst is produced by subjecting the residual gas to a hydrogenation and hydrolysis treatment to provide the sulfur compounds in the unique form of H.sub.2 S and to cooling with water separation by condensation and then to catalytic oxidation of H.sub.2 S in CLAUS stoichiometry with cooling of the gas stream obtained from the oxidation step under 160.degree. C. in order to separate the sulfur by condensation. Application to the purification of the residual gases emitted by CLAUS sulfur plants.

REFERENCES:
patent: 4097585 (1981-06-01), Fischer
patent: 4436716 (1984-03-01), Kvasnikoff et al.
patent: 4479928 (1984-10-01), Voirin
patent: 4552746 (1985-11-01), Kettner et al.
patent: 4605546 (1986-08-01), Voirin
Lauer et al., Chemical Engineering Techniques, Reinhold Publishing Corp., 1952, pp. 220-222.
Olsen, Unit Processes and Principles of Chemical Engineering, Van Nostrand Co., Inc., 1932, pp. 1-3.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for removing sulphur compounds contained in a residual g does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing sulphur compounds contained in a residual g, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing sulphur compounds contained in a residual g will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-841835

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.