CVD-compatible tungsten halogen phosphine complex compounds and

Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing

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556 1, 556 26, 423 53, 423 60, C07F 1100

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050736450

ABSTRACT:
The present invention is directed to tungsten halogen phosphine complex compounds having the formula W(PX.sub.3).sub.6-n L.sub.n wherein X is fluorine or chlorine, L is molecular nitrogen, acetone or other ketones or aldehydes, carbon monoxide, acetonitrile or other nitriles, diphenylethine or other ethines, diethylether or tetrahydrofurane or other open-chained or cyclic ethers, benzene or other aromatics, ethene or 1,5-cyclooctodiene or cycloheptatriene or other mono, di, or, respectively, triolefines, whereby two single-tooth ligands L can be replaced by one .mu..sup.4 -ligand or three single-tooth ligands L can be replaced by one .mu..sup.6 -ligand and n is a whole number from 0 to 5, as well as methods for the manufacture thereof. These substances are easily volatile in a vacuum and can be decomposed at extremely low temperatures and are therefore extremely well suited for CVD depositions in semiconductor technology, particularly, as via hole fillers in VLSI circuits.

REFERENCES:
patent: 3619288 (1971-11-01), Sirtl
patent: 3661843 (1972-05-01), Hechenbleikner et al.
patent: 4012399 (1977-03-01), Hechenbleikner et al.
Article by T. H. Kruck et al, from the periodical "Anorganische Allgemeine Chemie", 397, 1973, pp. 31-39.
Article by T. H. Kruck et al, from the periodical "Angewandte Chemie", 79, 1967, pp. 27-43.
Photoelectron Spectroscopic Study of Metal Trifluorophosphine and Hydridotrifluorophosphine Complexes, Journal of the Chemical Society Dalton Transactions 20, 1975, pp. 2054-2059.
Synthesis, Mass Spectra, Raman and Infrared Spectra of the Complexes M (PF.sub.3).sub.6 (M=Cr. Mo, W), Journal of Organometallic Chemistry 57, 1973, pp. 169-181.
Trifluorophosphine Complexes of Transition Metals, Angewandte Chemie International Edition, vol. 6, No. 1, 1967, pp. 53-67.

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