Film thickness measuring apparatus and method

Radiant energy – Invisible radiant energy responsive electric signalling – Infrared responsive

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250338, G01J 100

Patent

active

041297814

ABSTRACT:
An optical apparatus is disclosed for measuring and monitoring the thickness of a partially transparent film, or coating, which is either self-supporting or attached to a reflecting substrate. Infra-red radiation strikes the reflecting surface at an angle of incidence which is at or near the Brewster's angle of the film material. The radiation is polarized in its plane of incidence, which must be maintained substantially parallel to any stria in the reflecting surface. The polarization may be provided by germanium plates which receive the radiation at an angle of incidence at or near the Brewster's angle of the germanium.

REFERENCES:
patent: 3355980 (1967-12-01), Mathias
patent: 3426201 (1969-02-01), Hilton et al.
patent: 3437811 (1969-04-01), Willis et al.
patent: 3824017 (1974-07-01), Galyon
patent: 3904293 (1975-09-01), Gee
patent: 3994586 (1976-11-01), Sharkins et al.
patent: 4015127 (1977-03-01), Sharkins

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Film thickness measuring apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film thickness measuring apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film thickness measuring apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-832905

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.