Plasma enhanced diffusion process

Details Plasma enhanced diffusion process Plasma enhanced diffusion process

1983-12-19

1985-06-04

Childs, Sadie L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 85, 427259, 427377, 427379, 4274192, 4274197, B05D 306

Patent

active

045214417

ABSTRACT:
A process is disclosed for doping a semiconductor substrate which achieves a lower sheet resistivity than is otherwise obtainable. A spin-on dopant material is applied to the surface of the semiconductor substrate and subsequently heated to drive off solvents contained in the dopant material. The layer of spin-on dopant material is then plasma treated, preferably in an oxygen plasma, to enhance the diffusion properties of the spin-on material. The substrate and dopant material are then heated to an elevated temperature to accomplish the desired depth of diffusion.

REFERENCES:
patent: 3718502 (1973-02-01), Gibbons
patent: 3765940 (1973-10-01), Hentzschel
patent: 4243427 (1981-01-01), DiBugnara
patent: 4382099 (1983-05-01), Legge et al.
patent: 4411734 (1983-10-01), Maa

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