Production method for deposited film, production method for phot

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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136259, 20419229, 20419227, 20429802, 438 72, H01L 3118

Patent

active

059987308

ABSTRACT:
The present invention is to provide a production method for a deposit film comprising: a step of forming a reflecting layer on a substrate by opening a film forming chamber to the atmosphere, reducing the pressure of the film forming chamber, heating the film forming chamber to a temperature higher than a predetermined film forming temperature followed by cooling or self-cooling, and setting the film forming chamber at the predetermined film forming temperature, a step of contacting the reflecting layer surface with active oxygen and/or oxygen ion, and a step of forming a transparent conductive layer. According to the present invention, highly reliable reflecting layer and transparent conductive layer having a high reflectance can be stably obtained with a desired texture structure at a low cost.

REFERENCES:
patent: 4419533 (1983-12-01), Czubatyj et al.
patent: 4532372 (1985-07-01), Nath et al.
patent: 5500055 (1996-03-01), Toyama et al.
patent: 5612229 (1997-03-01), Yoshida

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