Multi-rod type magnetron sputtering apparatus

Details Multi-rod type magnetron sputtering apparatus Multi-rod type magnetron sputtering apparatus

1988-11-29

1989-11-07

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, C23C 1434

Patent

active

048790176

ABSTRACT:
A glow discharge magnetron sputtering apparatus having an improved multi-rod type target which produces a more uniform and higher rate of deposition on a substrate than obtainable in prior art devices, and which is particularly suitable for use in connection with the deposition of the magnetic materials. The apparatus includes a cathode comprising a cathode body, a backing plate connected removably with the cathode body, a copper-made common plate bonded to the bottom of the backing plate, and a target composed of a plurality of rods of material to be sputtered. Each rod has a sputtering surface of hemisphere form on the apex thereof.

REFERENCES:
patent: 3649502 (1972-03-01), Herte et al.
patent: 3829373 (1974-08-01), Kuehnle
patent: 3956093 (1976-05-01), McLeod
patent: 4100055 (1978-07-01), Rainey
patent: 4401546 (1983-08-01), Nakamura et al.
patent: 4448652 (1984-05-01), Pachonik
patent: 4569745 (1986-02-01), Nagashima

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