Photolabile blocked surfactants and compositions containing the

Details Photolabile blocked surfactants and compositions containing the Photolabile blocked surfactants and compositions containing the

1986-01-06

1988-04-26

Lilling, Herbert J.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

430253, 430270, 522 65, 524198, 524199, 524200, 560157, 560161, 560163, 560164, 560165, 560166, 560167, 260404, C11C 1100, C09F 500, C07F12506

Patent

active

047406003

ABSTRACT:
Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials.
Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

REFERENCES:
patent: 3060023 (1962-10-01), Burg et al.
patent: 3133902 (1964-05-01), Denchfield
patent: 3203805 (1965-08-01), Burg et al.
patent: 3247162 (1966-04-01), Newland et al.
patent: 3353955 (1967-11-01), Colgrove
patent: 3436402 (1969-04-01), Cassady et al.
patent: 3445229 (1969-05-01), Webers
patent: 3469982 (1969-09-01), Celeste
patent: 3591377 (1971-07-01), Alsup
patent: 3607264 (1971-09-01), Celeste et al.
patent: 3745188 (1973-07-01), Bottorff
patent: 3770438 (1973-11-01), Celeste
patent: 3840579 (1974-10-01), Fan
patent: 3849137 (1974-11-01), Barzynski et al.
patent: 3877941 (1975-04-01), Lohmann
patent: 3926636 (1975-12-01), Barzynski et al.
patent: 3954826 (1976-05-01), Sugimoto et al.
patent: 3997349 (1976-12-01), Sanders
patent: 4050936 (1977-09-01), Takeda et al.
patent: 4075175 (1978-02-01), Foss
patent: 4086210 (1978-04-01), Petropoulos
patent: 4155892 (1979-05-01), Emmons et al.
patent: 4205989 (1980-06-01), Moriya et al.
patent: 4287255 (1981-09-01), Wong et al.
patent: 4288479 (1981-09-01), Brack
patent: 4369244 (1983-01-01), Eian et al.
patent: 4467022 (1984-08-01), Eian et al.
patent: 4478967 (1984-10-01), Eian et al.
patent: 4511641 (1985-04-01), Busman et al.
patent: 4511730 (1985-04-01), Fields
patent: 4554238 (1985-11-01), Bushman
patent: 4599273 (1986-07-01), Eian et al.
Inou et al., Nippon Shashin Gakkai-Shi, vol. 41, No. 4, pp. 245-249 (1978); Homma et al., pp. 250-253.
Komoto and Co. Ltd., Tokio (German Pat. No. 2,716,422).
Berkower et al., Photographic Science and Engineering, vol. 12, No. 6, Nov.-Dec. pp. 283-287 (1967).
Nakayama et al., Society of Photographic Scientists and Engineers, vol. 22, No. 3, pp. 138-141, May-Jun. (1978).
Amit et al., Photosensitive Protecting Groups, Israel J. of Chem. 12 (1-2), 103-113 (1974).
Woodruff et al., Photographic Science and Engineering, vol. 11, No. 2, pp. 93-97; Mar.-Apr. (1967).
Chem. Abs. 79-42074, Babayan et al. (1973).
Rosen, "Surfactants & Interfaced Phenomena", 1978, Wiley & Son, pp. 83-86.
Rajasekharan Photoremovable Protecting Group in Organic Synthesis, 1980 (1) 1-26 Synthesis.

Affiliated with

Also associated with

Rating

Photolabile blocked surfactants and compositions containing the does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolabile blocked surfactants and compositions containing the , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolabile blocked surfactants and compositions containing the will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-820577