FLC device with color filter and insulating protection layer wit

Details FLC device with color filter and insulating protection layer wit FLC device with color filter and insulating protection layer wit

1989-03-27

1992-01-07

Miller, Stanley D.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359 79, 359 81, 359 76, 359104, G02F 113

Patent

active

050784757

ABSTRACT:
A liquid crystal device comprises a pair of substrates and a ferroelectric liquid crystal disposed between the substrates. At least one of the substrates has thereon a color filter layer and a protection layer for preventing direct contact between the color filter and the ferroelectric liquid crystal. Particulate spacers are preferably disposed between the substrates. The protection layer preferably comprises a film having a pencil hardness of HB or harder (JIS K 5401).

REFERENCES:
patent: 3912365 (1975-10-01), Lowell
patent: 4367924 (1983-01-01), Clark et al.
patent: 4560241 (1985-12-01), Stolov et al.
patent: 4593978 (1986-06-01), Mourey et al.
patent: 4632514 (1986-12-01), Ogawa et al.
patent: 4709991 (1987-12-01), Hoshikawa
patent: 4712873 (1987-12-01), Kanbe
patent: 4712875 (1987-12-01), Tsuboyama et al.
patent: 4712878 (1987-12-01), Taniguchi et al.
patent: 4744637 (1988-05-01), Sekimura et al.
patent: 4775225 (1988-10-01), Tsuboyama et al.
patent: 4818429 (1989-04-01), Saito et al.
patent: 4879144 (1989-11-01), Nakura et al.
Ferroelectrics, vol. 59 (1984) 25:67.
Proc. Sid., vol. 24, No. 2 (1983) 163:7.

Affiliated with

Also associated with

Rating

FLC device with color filter and insulating protection layer wit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with FLC device with color filter and insulating protection layer wit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and FLC device with color filter and insulating protection layer wit will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-817252