Photosensitive compositions

Details Photosensitive compositions Photosensitive compositions

1982-04-01

1983-08-16

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 5, 430145, 430176, 430177, 430191, 430192, 430193, 430292, 430294, G03C 154, G03C 160, G03C 171

Patent

active

043992102

ABSTRACT:
A photosensitive composition containing at least one o-naphthoquinonediazide compound represented by the following general formula (I): ##STR1## wherein A represents a divalent aliphatic residue, a divalent substituted aliphatic residue, a divalent aromatic residue or a divalent substituted aromatic residue, and a discoloring agent which changes its color tone upon the interaction with a photodecomposition product of the o-naphthoquinonediazide compound.
The photosensitive composition directly provides visible contrast between exposed portions and unexposed portions upon light exposure without development and is particularly useful for making lithographic printing plates, letterpress printing plates, IC circuits, photomasks, etc.

REFERENCES:
patent: 3046123 (1962-09-01), Sus et al.
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3669658 (1972-06-01), Yonezawa et al.
patent: 3969118 (1976-07-01), Stahlhofen et al.
patent: 3984250 (1976-10-01), Holstead
patent: 4028111 (1977-07-01), Iwasaki et al.
patent: 4115128 (1978-09-01), Kita
patent: 4163672 (1979-08-01), Stahlhofen
patent: 4207107 (1980-06-01), Ross
patent: 4294905 (1981-10-01), Okishi et al.
patent: 4307173 (1981-12-01), Gverter

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