Transmittance modulation photomask, process for producing the sa

Details Transmittance modulation photomask, process for producing the sa Transmittance modulation photomask, process for producing the sa

1987-12-01

1989-06-27

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 1, 430321, 430323, 35016222, G03F 100

Patent

active

048429694

ABSTRACT:
The present invention provides a process for producing a blazed diffraction grating by using a transmission modulation diffraction grating as a photomask in photolithography. The photomask is composed of a relief modulation diffraction grating (A) made of a transparent material and a blazed diffraction grating (B) made of a material containing a ray absorbing agent. The diffraction grating (A) and the diffraction grating (B) are mated with each other through their grating surfaces.

REFERENCES:
patent: 3777633 (1973-12-01), Kirk
patent: 4414317 (1983-11-01), Culp et al.

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