Gas separation – Residue access – handling or removing means – With means effecting or assisting discharge of residue
Patent
1997-06-06
1999-03-16
Bushey, C. Scott
Gas separation
Residue access, handling or removing means
With means effecting or assisting discharge of residue
134166C, 96228, 96426, B01D 4100
Patent
active
058823662
ABSTRACT:
An apparatus for conveying a process gas stream from an upstream source to a downstream treatment unit, including a manifold receiving gas from the upstream source, including first and second valved inlet lines which are alternatingly employed to flow gas to a downstream process. The manifold is arranged so that one of such lines is actively flowing gas from the upstream source to the downstream process, while the other is blocked by closure of the valve therein and is undergoing regeneration. A pressurized water source is coupled with the manifold, by valved water flow lines to each of the first and second inlet lines, with the water flow line valves being selectively openable or closeable to establish or discontinue flow of pressurized water therethrough, respectively. Cycle timer control means are employed to control the operation of the manifold and valves, for water cleaning of the off-stream inlet line.
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Balliew Patrick
Holst Mark
ATMI Ecosys Corporation
Bushey C. Scott
Hewlett-Packard Corporation
Hultquist Steven J.
Zitzmann Oliver A. M.
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