Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-11-09
1991-01-29
Morganstern, Norman
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118726, 118730, 427 531, 427 541, C23C 1648
Patent
active
049878557
ABSTRACT:
A reactor for laser-assisted CVD has a cylindrical symmetry and includes a high-speed horizontal rotating disk susceptor. The reactor of the invention provides for radiation, preferably UV laser radiation, to be introduced into the reactor radially along an axis. The radiation is constrained to occupy a thin region of space at or immediately adjacent to substrate surfaces upon which deposition is to occur. Preferably the radiation is provided as an annular beam that is reflected uniformly by a conical reflector to provide a relatively thin and uniform sheet of UV radiation that is approximately 0.1 mm to approximately 1.0 mm thick. In addition the reactor provides for Hg vapor, or any other gaseous reactant, to be introduced into the reactor at a same point on the axis as the laser radiation, separately from other reactants, and from a source coaxially disposed and external to the reactor.
REFERENCES:
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patent: 4657777 (1987-04-01), Hirooka et al.
patent: 4664057 (1987-05-01), Hemmati
patent: 4702936 (1987-10-01), Maeda et al.
patent: 4732793 (1988-03-01), Itoh
Denson-Low W. K.
Morganstern Norman
Owens Terry J.
Santa Barbara Research Center
Schubert W. C.
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