Method for separating gaseous and vaporous or liquid mixtures by

Details Method for separating gaseous and vaporous or liquid mixtures by Method for separating gaseous and vaporous or liquid mixtures by

1985-04-09

1988-09-13

Spear, Frank

Liquid purification or separation

Processes

Liquid/liquid solvent or colloidal extraction or diffusing...

210651, 21050036, B01D 1300

Patent

active

047707852

ABSTRACT:
A process for separating mixtures of gases, vapors or liquids by diffusion through membranes. The object, the improvement of the degree of enrichment and of the separation characteristics, is accomplished by irradiating membranes with heavy ions perpendicularly or at an angle to their surfaces to produce latent nuclear traces. Without etching away the nuclear traces, the membranes are charged from one side with the mixture, a pressure differential is set-up, and the substances from the mixture are removed downstream from the other side, independently of the concentration difference, separating the components according to their rates of diffusion. The process has the further advantage that the components of the mixture to be separated are neither thermally stressed nor chemically changed. The process is suitable for the separation of a multitude of atomic and molecular mixtures.

REFERENCES:
patent: 2984623 (1961-05-01), Lee
patent: 3950247 (1976-04-01), Chiang et al.
patent: 4115303 (1978-09-01), Marchand et al.
R. L. Fleischer et al., "Particle Track Etching", Science, vol. 178, pp. 255-263 (1972).
VDI-Z, 119, Nr. 15/16, p. 806 (1977).

Affiliated with

Also associated with

Rating

Method for separating gaseous and vaporous or liquid mixtures by does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for separating gaseous and vaporous or liquid mixtures by, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for separating gaseous and vaporous or liquid mixtures by will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-805509