Dynamic information storage or retrieval – Specific detail of information handling portion of system – Radiation beam modification of or by storage medium
Patent
1993-12-23
1994-07-05
Hannaher, Constantine
Dynamic information storage or retrieval
Specific detail of information handling portion of system
Radiation beam modification of or by storage medium
369122, 369 4412, G02B 632
Patent
active
053274156
ABSTRACT:
An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.
REFERENCES:
patent: 4716559 (1987-12-01), Hine
patent: 4861128 (1989-08-01), Ishikawa et al.
patent: 4893296 (1990-01-01), Matsumoto et al.
patent: 4901329 (1990-02-01), Leas
patent: 4950622 (1990-08-01), Kwon et al.
patent: 5001719 (1991-03-01), Trussell
patent: 5218584 (1993-06-01), Gfeller
Patent Abstracts of Japan, vol. 016, No. 074 (E-1170) & JP-A-32 65 117 (Mitsubishi Electric Corp), 26 Nov. 1991.
Elektronik, vol. 37, No. 8, Jul. 1987, Munchen DE, pp. 69-77, E.-K. Aschmoneit `Mikromechanik in der Elektronik`.
J. Mohr et al, "Requirements on Resist Layers in Deep-Etch Synchrotron Radiation Lithography", J. Vac. Sci. Technol B 6(6), Nov.-Dec. 1988, pp. 2264-2267.
G. T. Forrest, "Large-scale Laser Integration Arrives", Laser Focus World, Nov. 1989, p. 21.
P. Buchmann et al, "Smooth Angled Mirror Facet Fabrication", IBM Technical Disclosure Bulletin, vol. 32, No. 8A, Jan. 1990, pp. 155-156.
P. Buchmann et al, "Vertically Emitting Diode Laser with Integrated Front-Beam Monitor Photodiode", IBM Technical Disclosure Bulletin, vol. 32, No. 8A, Jan. 1990, pp. 149-150.
P. Mooney, "Photodiode Array for Monitoring Individual Lasers in a Laser Array", IBM Technical Disclosure Bulletin, vol. 27, No. 7B, Dec. 1984, pp. 4344-4345.
D. J. Webb et al, "Mirror Fabrication for Full-Wafer Laser Technology", Laser Diode Technology and Applications III, 23-25 Jan. 1991, SPIE Proceedings Series vol. 1418, pp. 231-239.
P. Vettiger et al, "Full Wafer Technology-A New Approach to Large-Scale Wafer Fabrication and Integration", IEEE Journal of Quantum Electronics, vol. 27, No. 6, Jun. 1991, pp. 1319-1331.
Vettiger Peter
Voegeli Otto
Hannaher Constantine
International Business Machines - Corporation
Wong Don
LandOfFree
Integrated light deflector and method of fabrication therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Integrated light deflector and method of fabrication therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated light deflector and method of fabrication therefor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-801842