Semiconductor manufacturing method and semiconductor device manu

Details Semiconductor manufacturing method and semiconductor device manu Semiconductor manufacturing method and semiconductor device manu

1996-03-14

1997-12-02

Bowers, Jr., Charles L.

Fishing, trapping, and vermin destroying

437225, 437196, H01L 2102

Patent

active

056935790

ABSTRACT:
To provide a semiconductor device manufacturing method and a semiconductor device manufacturing apparatus in which both a dependency on base material and a film characteristic are satisfied in film forming steps of the semiconductor manufacturing. There are provided a first film forming part 4 and a second film forming part 5 along a transporting direction A in the transporting system 1 for the semiconductor substrate 2, the first film forming part 4 is provided with a post-mixed type gas supplying means 7 for supplying a plurality of kinds of reaction gases onto a semiconductor substrate while the gases are being separated from each other through an inert gas, and the second film forming part 5 is provided with a premixed type gas supplying means 8 for supplying the mixture gas onto the semiconductor substrate while a plurality of kinds of reaction gases are mixed in advance.

REFERENCES:
patent: 5518962 (1996-05-01), Murao

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