Use of an arylsulphonylurethane as film forming resin in nitroce

Details Use of an arylsulphonylurethane as film forming resin in nitroce Use of an arylsulphonylurethane as film forming resin in nitroce

1993-05-04

1994-07-05

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Processes of preparing a desired or intentional composition...

528 69, 524716, 524840, 560 29, C08L 118, C07C26512

Patent

active

053267966

ABSTRACT:
The present invention lies in the field of nitrocellulose nail varnishes and its subject is the use of an arylsulphonylurethane as film forming resin in these varnishes, which makes it possible in particular to avoid the release of formaldehyde, a carcinogenic compound which is formed when an arylsulphonamide-formaldehyde resin is employed.
Another subject of the invention is new poly(arylsulphonylurethanes) containing from 2 to 5 arylsulphonylurethane groups and possessing a molecular mass of between 450 and 1500.

REFERENCES:
patent: 3607935 (1971-11-01), Hilmer et al.
patent: 3687934 (1972-08-01), Dietrich et al.
patent: 3787491 (1974-01-01), Bretschndier et al.
patent: 3864294 (1975-02-01), Busch, Jr.
patent: 3925527 (1975-12-01), Kleimann et al.
patent: 3933894 (1976-01-01), Stephens
patent: 4224418 (1980-09-01), Dieterich et al.
patent: 4513127 (1985-04-01), Jacobine
patent: 4661542 (1987-04-01), Gilch et al.
patent: 4772329 (1988-09-01), Luhmann et al.
patent: 4820509 (1989-04-01), Yamazaki et al.
patent: 5008311 (1991-04-01), Janoski

Affiliated with

Also associated with

Rating

Use of an arylsulphonylurethane as film forming resin in nitroce does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Use of an arylsulphonylurethane as film forming resin in nitroce, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Use of an arylsulphonylurethane as film forming resin in nitroce will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-796317