Complex-forming polymers and processes to prepare them

Details Complex-forming polymers and processes to prepare them Complex-forming polymers and processes to prepare them

1989-01-09

1990-03-20

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

526265, 526259, C08F 830

Patent

active

049102648

ABSTRACT:
The invention is a complex-forming polymer comprising at least one aryl group having a 2,2'-bipyridine complex-forming moiety or a 1,10-phenanthroline complex-forming moiety. The complex-forming polymers are prepared by contacting a substituted 2,2'-bipyridine or a substituted 1,10-phenanthroline compound with a metalating agent, and then reacting the metalated compound with an halomethylated polystyrene polymer, or alternatively, reacting the metalated compound with at least one vinylbenzyl halide and subsequently polymerizing the reaction product. The complex-forming polymers are hydrolytically stable and may be used as polymeric ligands as such or complexed with selected metal compounds.

REFERENCES:
patent: 3436395 (1969-04-01), Ennis et al.
patent: 3810888 (1974-05-01), Chapuriat
patent: 4158093 (1979-06-01), Bailey et al.
patent: 4188395 (1980-02-01), Bossert et al.
patent: 4424359 (1984-01-01), Kaschig et al.
Three-Phase Test. Detection of Free Cyclobutadiene by Julius Rebek, Jr. and F. Gavina, Sep. 11, 1974.
Poly(styryl)bipyridine: Synthesis and Formation of Transition-Metal Complexes . . . by Roger J. Card and Douglas C. Neckers, 11-23-77.

Affiliated with

Also associated with

Rating

Complex-forming polymers and processes to prepare them does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Complex-forming polymers and processes to prepare them, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Complex-forming polymers and processes to prepare them will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-793480