Apparatus and method for treating material surfaces

Details Apparatus and method for treating material surfaces Apparatus and method for treating material surfaces

1988-07-29

1990-03-20

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118723, 118715, 118719, 118725, 156345, 156643, 134 1, 134 221, C23C 1600, B05D 306

Patent

active

049100424

ABSTRACT:
An apparatus and a method for coating electronic elements in particular semi-conductor wafers, circuit boards and the like are provided where the flow of the gaseous coating material is directed so that a contamination of the elements through deposited remains in the reaction tube from previous coating processes can be largely avoided. In addition, an integrated apparatus for cleaning the coating apparatus with a plasma is provided. In an in-situ cleaning method, a plasma generated with microwaves is fed into the reaction tube and the inner surfaces of the reaction tube are cleaned by dry etching.

REFERENCES:
patent: 4138306 (1979-02-01), Niwa
patent: 4232063 (1980-11-01), Rosler et al.
patent: 4576698 (1986-03-01), Gallagher et al.
patent: 4636401 (1987-01-01), Yamagaki et al.
patent: 4747368 (1988-05-01), Brien et al.
patent: 4786352 (1988-11-01), Benzing

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