Photographic material which contains a UV absober

Details Photographic material which contains a UV absober Photographic material which contains a UV absober

1992-09-01

1994-03-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430931, 252589, 548261, G03C 1815

Patent

active

052983803

ABSTRACT:
Compounds of formula ##STR1## wherein R.sub.1 is hydrogen, alkyl, phenylalkyl or cyclohexyl, R.sub.2 is alkyl, phenylalkyl, cyclohexyl, alkoxy or hydroxyalkoxy, and R.sub.3 is phenyl or substituted phenyl, are very suitable for use as UV absorbers in photographic materials with transparent substrates.

REFERENCES:
patent: 3738837 (1973-06-01), Kuwabara et al.
patent: 4200464 (1980-04-01), Shishido et al.
patent: 4220711 (1980-09-01), Nakamura et al.
patent: 4946768 (1990-08-01), Vallarino
patent: 4996326 (1991-02-01), Leppard et al.
patent: 5047314 (1991-09-01), Sakai et al.
Abstract of Japanese Patent J6 2118-344A, Nov. 1985, Konishiroku Photo KK (Corresponds to Applicants Ref. AS).
C.A. 107: 225909f, 1987.
Abst. 87-188723/27.

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