Chemical vapor deposition method

Details Chemical vapor deposition method Chemical vapor deposition method

1995-05-25

1996-12-03

Breneman, R. Bruce

Fishing, trapping, and vermin destroying

118715, 118724, 427576, 117 83, H01L 2144

Patent

active

055808220

ABSTRACT:
A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.

REFERENCES:
patent: 5445568 (1995-09-01), Hayakawa
patent: 5462014 (1995-10-01), Awaya et al.

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