Method of producing a semiconductor device using a single mask m

Fishing – trapping – and vermin destroying

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437 28, 437 29, 437 31, 437 40, 148DIG82, 148DIG83, 357 231, 357 34, 357 41, H01L 2100, H01L 2102, H01L 21265, H01L 21306

Patent

active

050231910

ABSTRACT:
A single mask method for providing multiple masking patterns, using excess etching techniques, which is usable for developing a semiconductor substrate for a semiconductor device which results in an increased current being required before latchup occurs in the semiconductor device.

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