Process for producing electron emission device

Details Process for producing electron emission device Process for producing electron emission device

1989-05-01

1991-06-11

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 77, 427 78, 427124, 427125, 4271263, 4272552, 4272553, 427294, 4273722, 4273831, 4273977, B05D 314

Patent

active

050231103

ABSTRACT:
A process for producing an electron emission device having voltage controlled negative resistance (VCNR) characteristics. A conductive thin film containing fine particles of a metal, metal oxide, semiconductor or the like is formed on a substrate between opposing electrodes which are also form on the substrate. A voltage is applied across the conductive thin film to generate heat with which the conductive thin film is heat treated to have an island structure which is formed of a spatially discontinuous film of fine particles and which serves as an electron emitting region.

REFERENCES:
patent: 4104605 (1978-08-01), Boudreaux et al.
patent: 4142008 (1979-02-01), Debolt
patent: 4242805 (1981-01-01), De Angelis
patent: 4292344 (1981-09-01), McHale
patent: 4306897 (1981-12-01), Maklad
"The Emission of Hot Electrons and the Field Emission of Electrons from Tin Oxide", by M. I. Elinson et al., Radio Eng. Electron Physics, vol. 10, pp. 1290-1296, 1964.
"Electrical Conduction and Electron Emission of Discontinuous Thin Films", by G. Dittmer, Thin Solid Films, vol. 9, No. 3, pp. 317-328, Mar. 1972.
"Strong Electron Emission from Patterned Tin-Indium Oxide Thin Films", by M. Hartwell et al., 1975 International Electron Devices Meeting, pp. 519-521, Dec., 1975.
"Electroforming and Electron Emission of Carbon Thin Films", by H. Araki, Journal of Vacuum Society of Japan, vol. 26, No. 1, pp. 22-29, 1983.

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