Method of stabilizing organic substrate materials against light

Details Method of stabilizing organic substrate materials against light Method of stabilizing organic substrate materials against light

1978-10-30

1980-12-30

Brown, Travis

Radiation imagery chemistry: process, composition, or product th

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430216, 430372, 430382, 430384, 430386, 430388, 430544, 430551, 430933, 260429R, 260439R, G03C 700

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042424291

ABSTRACT:
The stability of organic substrate materials having an absorption peak between 300 and 800 nm in wavelength can be improved by the presence of a compound having the following general structural formula (I): ##STR1## wherein M represents Cu, Co, Ni, Pd or Pt; R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represents a hydrogen or halogen atom, a cyano, an alkyl, an aryl, a cycloalkyl, or a heterocyclic group which may be substituted or unsubstituted and which is attached to the carbon atom in the benzene ring directly or through a divalent connecting group; alternatively, each of R.sub.1 and R.sub.2, R.sub.2 and R.sub.3, or R.sub.3 and R.sub.4 may combine to form the non-metallic atoms necessary to complete a 6-membered ring; and R.sub.5 represents a hydrogen atom or methyl.

REFERENCES:
patent: 3161520 (1964-12-01), Rauch et al.
patent: 3588216 (1971-06-01), Bloom
patent: 3672898 (1972-06-01), Schwan et al.
patent: 4050938 (1977-09-01), Smith, Jr. et al.
Bayer, Angew. Chem., vol. 73, 1961, p. 659, GDCH-Ortsverband Bonn.
Jadamus et al., J.A.C.S., 86, 1964, p. 3056, Metal Ion Induced Rearrangements.
Cicchetti, Adv. Polymere Sci., vol. 7, pp. 70-112 (1970), Mech. of Oxid. Photodegradation and UV Stabilization of Polyolefins.

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