Method of producing thin film

Details Method of producing thin film Method of producing thin film

1990-03-02

1992-02-11

Beck, Shrive

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427129, 427130, 427251, B05D 306, B05D 512, C23C 1600

Patent

active

050874764

ABSTRACT:
The method includes applying ions and electrons from an ion gun onto a polymer film while the polymer film is traveling circumferentially along a peripheral surface of a cylindrical can from a supply location to a take-up location of the polymer film relative to the cylindrical drum. The ions and electrons from the ion gun are applied onto a part of the polymer film while it is moving through a position near the supply location of the polymer film relative to the drum at which the polymer film begins to contact the outer peripheral surface of the drum. At a downstream location relative to the drum, electrons are applied from an electron gun onto the polymer film traveling on the drum surface. At a further downstream location relative to the drum, the thin film is deposited, e.g., by vacuum evaporation, on the polymer film travelling on the drum. This method enables a thin film, having no wrinkles and with a high adhesion strength with respect to the polymer film, to be produced in a stable manner.

REFERENCES:
patent: 4393091 (1983-07-01), Shinohara et al.
patent: 4489124 (1984-12-01), Watanabe
patent: 4557944 (1985-12-01), Arai et al.
patent: 4740385 (1988-04-01), Feuerstein et al.
patent: 4776925 (1988-10-01), Fossum et al.
patent: 4847109 (1989-07-01), Shibasaki et al.
patent: 4886681 (1989-12-01), Clabes et al.
patent: 4913933 (1990-04-01), Kasanuki et al.

Affiliated with

Also associated with

Rating

Method of producing thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing thin film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-780924