Method and apparatus for the production of SiC whisker

Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423345, C01B 21068, C30B 29062

Patent

active

050874330

ABSTRACT:
In the production of SiC whisker for composite materials such as FRP, FRM, FRC and the like by vapor phase synthesis between silicon sulfide and carbon compound, SiC whisker suitable for the continuation and mass production is produced in industrial scale by using metallic Si as a starting material through a stage of contacting the metallic silicon with hydrogen sulfide gas to produce silicon sulfide gas, and a stage of contacting the silicon sulfide gas with carbon compound and, if necessary, a formed nucleus to deposit and grow whisker.

REFERENCES:
patent: 3209981 (1973-01-01), Lee et al.
patent: 3933984 (1976-01-01), Kimura et al.
patent: 4552740 (1985-11-01), Morgan et al.
patent: 4640830 (1987-02-01), Arakawa
patent: 4789537 (1988-12-01), Shalek et al.
patent: 4855119 (1989-08-01), Minamikata et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for the production of SiC whisker does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for the production of SiC whisker, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the production of SiC whisker will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-780723

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.