Electron beam lens and deflection system for plural-level telece

Details Electron beam lens and deflection system for plural-level telece Electron beam lens and deflection system for plural-level telece

1991-01-07

1992-08-04

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 2504922, H01J 3730, H01J 3710

Patent

active

051361671

ABSTRACT:
A charged particle beam deflection system provides a three or more level charged particle beam deflection arrangement and is therefore capable of extremely high speed and positional accuracy. The system preferably employs a major/minor magnetic deflection arrangement as well as orthogonal electrostatic deflectors at a level of speed and positional accuracy and which minimizes the need for dynamic correction to achieve high linearity and positioning accuracy at extremely low aberration levels. The system can also be made relatively noise insensitive by providing one or more split deflectors which are also useful in providing increased speed and adjustment of radial and azimuthal telecentricity. The use of a transfer lens allows the cluster and subfield deflectors to be optimally placed to exploit different forms of LAD to obtain telecentricity at all levels of the deflection hierarchy. The use of such lens assisted deflection allows the electron optical system and drivers therefor to be minimized in number or enabled noise to be reduced and adjustments of telecentricity to be made without increase of complexity over the prior art. By employing the deflection arrangement of the present invention in electron beam lithography apparatus, the throughput of such apparatus can be greatly improved.

REFERENCES:
patent: 4140913 (1979-02-01), Anger et al.
patent: 4198569 (1980-04-01), Takayama
patent: 4544846 (1985-10-01), Langner et al.
patent: 4859856 (1989-08-01), Groves et al.
patent: 4945246 (1990-07-01), Davis et al.

Affiliated with

Also associated with

Rating

Electron beam lens and deflection system for plural-level telece does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam lens and deflection system for plural-level telece, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam lens and deflection system for plural-level telece will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-780216