Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1991-03-29

1992-08-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429835, 118719, 118729, 118730, 118731, 414217, 414222, 414225, C23C 1456

Patent

active

051356350

ABSTRACT:
The sputtering apparatus for the present invention is used for manufacturing optical discs. On loading and unloading of disc substrates to and from a vacuum chamber, a disc entrance and exit opening provided on the vacuum chamber is closed by a tray having an opening at the center thereof on which the disc substrate is placed and a push up rod having a closing side closing the opening of the tray on the lower side thereof. Sealing of the disc entrance and exit opening may be made positive and the vacuum chamber is uniformly evacuated so that an excellent sputtering can be performed.

REFERENCES:
patent: 4820106 (1989-04-01), Walde et al.

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