Method for purification of bases from materials comprising base

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

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2041825, 2041823, 204 98, 204301, C25B 700

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active

051356260

ABSTRACT:
The present invention is a method of recovery of base from material comprising base or acid and salt. The method is conducted in an apparatus comprising a cation membrane between two bipolar membranes.

REFERENCES:
patent: 2829095 (1958-04-01), Oda et al.
patent: 3111472 (1963-11-01), Oda et al.
patent: 3787304 (1974-01-01), Chlanda et al.
patent: 4024043 (1977-05-01), Dege et al.
patent: 4107015 (1978-08-01), Chlanda et al.
patent: 4116889 (1978-09-01), Chlanda et al.
patent: 4238305 (1980-12-01), Gancy et al.
patent: 4391680 (1983-07-01), Mani et al.
patent: 4474771 (1984-10-01), Morita
patent: 4536269 (1985-08-01), Chlanda et al.
patent: 4557815 (1985-12-01), Scott et al.
patent: 4608141 (1986-08-01), Chlanda et al.
patent: 4629545 (1986-12-01), Mani et al.
patent: 4738764 (1988-04-01), Chlanda et al.
patent: 4740281 (1988-04-01), Chlanda et al.
patent: 4766161 (1988-08-01), Chlanda et al.
patent: 4976838 (1990-12-01), Mani et al.
Chemical Abstracts (1959) 53:11070(b) Citing Japanese 2023 (1958).
Principles of Desalination, Chapter 6 "Electrodialysis" pp. 199-289 Shaffer et al., Academic Press (1966) (K. S. Spiegler, Editor).

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